Reflection of normally incident light from silicon solar cells with pyramidal textureBAKER-FINCH, Simeon C; MCINTOSH, Keith R.Progress in photovoltaics (Print). 2011, Vol 19, Num 4, pp 406-416, issn 1062-7995, 11 p.Article

Fast etch anti-reflective coating for sub-0.35μm i-line microlithography applicationsWILLIAMS, P; XIE SHAO; LAMB, J et al.SPIE proceedings series. 1998, pp 518-525, isbn 0-8194-2777-2Conference Paper

Theory of reflection from antireflection coatingsCLARKE, R. H.The Bell System technical journal. 1984, Vol 62, Num 10, pp 2885-2891, issn 0005-8580Article

Effect of Substrate Index of Refraction on the Design of Antireflection CoatingsWILLEY, Ronald R.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8168, issn 0277-786X, isbn 978-0-8194-8794-0, 81680C.1-81680C.6Conference Paper

Spiral Search Method for Designing a Wide Angular Broadband Visible Antireflection CoatingLIOU, Yeuh-Yeong; WEI, Zhi-Wei; WANG, Li-Rang et al.Optical review. 2009, Vol 16, Num 2, pp 176-179, issn 1340-6000, 4 p.Conference Paper

Imperfect antireflection coating effect reduction schemes for birefringent interleaver and optical communication systemsCHENG, Chi-Hao; SHUPING WANG.Optics and laser technology. 2008, Vol 40, Num 8, pp 1072-1077, issn 0030-3992, 6 p.Article

THEORETICAL PERFORMANCE OF AN ANTI-REFLECTION COATING FOR A DIODE LASER AMPLIFIERCLARKE RH.1982; INTERNATIONAL JOURNAL OF ELECTRONICS THEORETICAL & EXPERIMENTAL; ISSN 0020-7217; GBR; DA. 1982; VOL. 53; NO 5; PP. 495-499; BIBL. 5 REF.Article

Plasmon based antireflection coatings containing nanostructured Ag and silica mediumXINXING SUN; XIAOHONG CHEN; ZHEJUAN ZHANG et al.Applied surface science. 2012, Vol 258, Num 8, pp 3785-3788, issn 0169-4332, 4 p.Article

Homogeneous luminescent stain etched porous silicon elaborated by a new multi-step stain etching methodHAJJI, M; KHALIFA, M; BEN SLAMA, S et al.Applied surface science. 2013, Vol 284, pp 324-330, issn 0169-4332, 7 p.Article

Excellent antireflection properties of vertical silicon nanowire arraysSRIVASTAVA, Sanjay K; KUMAR, Dinesh; SINGH, P. K et al.Solar energy materials and solar cells. 2010, Vol 94, Num 9, pp 1506-1511, issn 0927-0248, 6 p.Conference Paper

BOUND-FREE EMISSION IN HGBRLAPATOVICH WP; GIBBS GR; PROUD JM et al.1982; APPLIED PHYSICS LETTERS; ISSN 0003-6951; USA; DA. 1982; VOL. 41; NO 9; PP. 786-788; BIBL. 15 REF.Article

Screen-printed solar cells with simultaneous formation of porous silicon selective emitter and antireflection coatingCHAOUI, Rachid; MESSAOUD, Abdelghani.Desalination (Amsterdam). 2007, Vol 209, Num 1-3, pp 118-121, issn 0011-9164, 4 p.Conference Paper

Influence of bias current and signal power on behaviour of an antireflection-coated laser amplifierWEBB, R. P; DEVLIN, W. J.Electronics Letters. 1986, Vol 22, Num 5, pp 255-256, issn 0013-5194Article

Mechanism of damage formation in antireflection coatingsYOSHIDA, K; YABE, T; YOSHIDA, H et al.Journal of applied physics. 1986, Vol 60, Num 4, pp 1545-1546, issn 0021-8979Article

Optimization of ARC process in DUV lithographySHIM, K.-J; CHOI, B.-I; PARK, K.-Y et al.SPIE proceedings series. 1998, pp 692-701, isbn 0-8194-2779-9Conference Paper

Influence of underlayer reflection on optical proximity effects in sub-quarter micron lithographySEKIGUCHI, A; UESAWA, F; TAKEUCHI, K et al.SPIE proceedings series. 1998, pp 347-355, isbn 0-8194-2779-9Conference Paper

Anti-reflection coatings for grazing incidence anglesMONGA, J. C.Journal of modern optics (Print). 1989, Vol 36, Num 3, pp 381-387, issn 0950-0340Article

Improvement of linewidth control with antireflective coating in optical lithographyYI-CHING LIN; PURDES, A. J; SALLER, S. A et al.Journal of applied physics. 1984, Vol 55, Num 4, pp 1110-1115, issn 0021-8979Article

Antireflection coating for sapphire with consideration of mechanical propertiesGÖDEKER, C; SCHULZ, U; KAISER, N et al.Surface & coatings technology. 2014, Vol 241, pp 59-63, issn 0257-8972, 5 p.Conference Paper

Optical reflection measurement system using a swept modulation frequency techniqueBRAUN, D. M; LEYDE, K. W.Optical engineering (Bellingham. Print). 1989, Vol 28, Num 3, pp 286-289, issn 0091-3286Article

Directly controlled deposition of antireflection coatings for semiconductor lasersSERENYI, M; HABERMEIER, H.-U.Applied optics. 1987, Vol 26, Num 5, pp 845-849, issn 0003-6935Article

Influence of external mirror on antireflection-coated phased-array semiconductor lasersHARDY, A; STREIFER, W; OSINSKI, M et al.Applied physics letters. 1986, Vol 49, Num 4, pp 185-187, issn 0003-6951Article

Practical design of double-layer antireflective coatings for high-index substratesLUBEZKY, I; LUBEZKY, A.Optical engineering (Bellingham. Print). 1983, Vol 22, Num 6, pp 753-755, issn 0091-3286Article

Three-layer antireflection coatings: a new method for design and optimizationNAGENDRA, C. L; THUTUPALLI, G. K. M.Applied optics. 1983, Vol 22, Num 24, pp 4118-4126, issn 0003-6935Article

Gradient-index antireflection coatingsSOUTHWELL, W. H.Optics letters. 1983, Vol 8, Num 11, pp 584-586, issn 0146-9592Article